Utsunomiya, Japan

Youji Kawasaki



Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2017-2022

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15 patents (USPTO):Explore Patents

Title: Youji Kawasaki: Innovator in Photo-Curable Technologies

Introduction

Youji Kawasaki is a prominent inventor based in Utsunomiya, Japan. He has made significant contributions to the field of photo-curable compositions and imprint technologies. With a total of 15 patents to his name, Kawasaki continues to push the boundaries of innovation in his industry.

Latest Patents

Kawasaki's latest patents include a photo-curable composition and a patterning method that utilizes this composition. This invention provides a photo-curable composition and a UV imprint method that requires a small demolding force. The composition contains a polymerizable monomer (A), a polymerization initiator (B), and a fluorine-containing surfactant (C). The resulting photo-cured product has a water contact angle of 74 degrees or less. Another notable patent is an imprint device designed to minimize the occurrence of pattern defects. This device is capable of forming a pattern made of an imprint material on a shot region of a substrate using a mold. It includes a supply unit for discharging the imprint material, a substrate stage for holding and moving the substrate, and a control unit that manages the substrate stage's movements to avoid defects.

Career Highlights

Kawasaki is currently employed at Canon Kabushiki Kaisha, where he applies his expertise in developing innovative technologies. His work has significantly advanced the capabilities of photo-curable materials and imprinting techniques.

Collaborations

Kawasaki collaborates with talented individuals such as Toshiki Ito and Shiori Yonezawa, contributing to a dynamic and innovative work environment.

Conclusion

Youji Kawasaki is a key figure in the field of photo-curable technologies, with a strong portfolio of patents that reflect his innovative spirit. His contributions continue to shape the future of imprinting and material science.

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