The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2019
Filed:
Jun. 18, 2014
Canon Kabushiki Kaisha, Tokyo, JP;
Toshiki Ito, Kawasaki, JP;
Takashi Yoshida, Utsunomiya, JP;
Hitoshi Sato, Utsunomiya, JP;
Youji Kawasaki, Utsunomiya, JP;
Akiko Iimura, Utsunomiya, JP;
Keiji Yamashita, Utsunomiya, JP;
Takehiko Ueno, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An imprint method includes: placing a light-curable composition on a workpiece substrate (placement); bringing the light-curable composition and a mold into contact with each other an atmosphere of a condensable gas (contact); aligning the mold and the workpiece substrate (alignment); irradiating the light-curable composition with light to obtain a light-cured composition (irradiation); and separating the light-cured composition and the mold from each other after the irradiation (release). The film thickness of the light-curable composition during the alignment is 20% or more greater than that of the light-cured composition after the release.