Kyoto, Japan

Yosuke Hanawa

USPTO Granted Patents = 14 

 

Average Co-Inventor Count = 2.5

ph-index = 3

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2017-2025

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14 patents (USPTO):

Title: Innovations in Substrate Processing: The Contributions of Yosuke Hanawa

Introduction: Yosuke Hanawa, an inventive mind based in Kyoto, Japan, is recognized for his significant contributions to the field of substrate processing technology. With a remarkable portfolio that includes 13 patents, Hanawa has been at the forefront of developing innovative methods and materials that enhance the precision and efficiency of substrate processing. His work is instrumental in industries that rely on advanced semiconductor technology.

Latest Patents: Among his latest patents, Yosuke Hanawa has developed a substrate processing liquid explicitly designed for etching metal layers. This innovative liquid includes chemical components that utilize hydroxide molecules, functioning effectively as an etchant to target metal or metal compound layers within trench structures. Additionally, Hanawa has patented a comprehensive substrate processing method and apparatus that introduces an atmosphere control step to optimize the solidification process of liquid films on substrates. These advancements reflect his dedication to addressing complex challenges within substrate processing.

Career Highlights: Yosuke Hanawa's career has been marked by his role at Screen Holdings Co., Ltd., where he has collaborated with a team of experts to push the boundaries of substrate processing technology. His contributions have paved the way for improved methods that significantly impact semiconductor manufacturing and other related fields.

Collaborations: Hanawa has worked alongside talented colleagues such as Yuta Sasaki and Katsuhiko Miya. Together, they have fostered a collaborative environment that promotes innovation and the development of cutting-edge technology within their organization.

Conclusion: Yosuke Hanawa's achievements as an inventor in substrate processing showcase his commitment to innovation and excellence in technology. His pioneering work not only contributes to advancements in semiconductor manufacturing but also underscores the vital role of inventors in shaping the future of technology. As the landscape of substrate processing continues to evolve, Hanawa's patents and methods will undoubtedly play a crucial role in driving progress in the industry.

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