The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 22, 2018

Filed:

Jan. 19, 2016
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Yosuke Hanawa, Kyoto, JP;

Katsuhiko Miya, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B 5/00 (2006.01); B01D 53/26 (2006.01); F26B 21/14 (2006.01);
U.S. Cl.
CPC ...
F26B 5/00 (2013.01); B01D 53/263 (2013.01); B01D 53/265 (2013.01); B01D 53/268 (2013.01); F26B 21/145 (2013.01); B01D 2256/24 (2013.01);
Abstract

When a substrate on which a fine pattern is formed is dried with vapor, prevention of collapse of the pattern due to water originally contained in IPA to be stored has been a problem to be solved. A mixed liquid stored in a mixed liquid storage is vaporized to generate mixed vapor containing the IPA and water (water vapor). Then, a vapor dewatering unit connected to a vapor supply pipe through which the mixed vapor is fed removes water in the mixed vapor. This can reduce the concentration of water originally contained in the IPA to be stored before the IPA is supplied to the substrate, thereby suppressing collapse of the pattern.


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