The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2026

Filed:

Jan. 20, 2022
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Yosuke Hanawa, Kyoto, JP;

Dai Ueda, Kyoto, JP;

Akiko Harumoto, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 50/28 (2026.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
H10P 50/283 (2026.01); H10P 72/0424 (2026.01); H10P 72/0604 (2026.01);
Abstract

This disclosure relates to a substrate treating method and a substrate treating apparatus. An additive is dissolved in a first treatment liquid. The first treatment liquid contains iodide ions (I). The substrate treating method includes an adjusting step and a supplying step. In the adjusting step, decrease in iodide ions (I) contained in the first treatment liquid is suppressed. Accordingly, the first treatment liquid contains a sufficient amount of iodide ions (I). In the supplying step, the first treatment liquid adjusted in the adjusting step is supplied to a substrate. Moreover, in the supplying step, a first etchant for etching the substrate is supplied to the substrate.


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