This inventor holds 27 USPTO granted patents and 5 published patent applications and 1 EPO patent, primarily in Substrate Treatment Technology. Top assignees: Dainippon Screen Mfg. Co., Ltd., Screen Semiconductor Solutions Co., Ltd., Sokudo Co., Ltd.. Active years: 1993-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Shimogyo-ku, JP (2014)
- Shiga, JP (2015)
- Kyoto, JP (1993 - 2019)
Company Filing History:


Years Active: 1993-2025
Areas of Expertise:
Title: Innovator Spotlight: Yoshiteru Fukutomi from Kyoto, JP
Introduction:
Yoshiteru Fukutomi, a prolific inventor hailing from Kyoto, Japan, has made significant contributions to the field of substrate treating apparatus design. With an impressive portfolio of 26 patents under his belt, Fukutomi's innovative solutions have revolutionized substrate treatment processes.
Latest Patents:
Fukutomi's latest patents showcase his expertise in developing advanced substrate treating apparatus. His creation of a substrate treating apparatus with parallel gas supply pipes and a gas exhaust pipe demonstrates his commitment to optimizing resist film forming and developing treatments on multiple stories concurrently. Additionally, his multi-story substrate treating apparatus with flexible transport mechanisms and vertically divided treating units highlights his ingenuity in streamlining substrate treatment processes across different heights within the apparatus.
Career Highlights:
Having worked at esteemed companies such as Dainippon Screen Mfg. Co., Ltd. and Screen Semiconductor Solutions Co., Ltd., Fukutomi has honed his skills and expertise in the realm of substrate treatment technology. His innovative mindset and dedication to advancing the field have positioned him as a pioneer in the industry.
Collaborations:
Throughout his career, Fukutomi has collaborated with talented individuals such as Tsuyoshi Mitsuhashi and Hiroyuki Ogura. These fruitful collaborations have not only led to the development of groundbreaking technologies but also fostered a culture of innovation and knowledge-sharing within the industry.
Conclusion:
In conclusion, Yoshiteru Fukutomi's exceptional work in the field of substrate treating apparatus design has left an indelible mark on the industry. His inventive solutions and collaborative spirit continue to inspire and drive progress within the realm of substrate treatment technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile