The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Dec. 23, 2008
Hiroyuki Ogura, Kyoto, JP;
Tsuyoshi Mitsuhashi, Kyoto, JP;
Yoshiteru Fukutomi, Kyoto, JP;
Kenya Morinishi, Kyoto, JP;
Yasuo Kawamatsu, Kyoto, JP;
Hiromichi Nagashima, Kyoto, JP;
Hiroyuki Ogura, Kyoto, JP;
Tsuyoshi Mitsuhashi, Kyoto, JP;
Yoshiteru Fukutomi, Kyoto, JP;
Kenya Morinishi, Kyoto, JP;
Yasuo Kawamatsu, Kyoto, JP;
Hiromichi Nagashima, Kyoto, JP;
SCREEN SEMICONDUCTOR SOLUTIONS CO., LTD., Kyoto, JP;
Abstract
A substrate treating apparatus for treating substrates includes a plurality of substrate treatment lines arranged vertically for carrying out plural types of treatment on the substrates while transporting the substrates substantially horizontally, and a controller for changing processes of treatment carried out on the substrates for each of the substrate treatment lines. By changing the processes of treatment carried out for the substrates for each substrate treatment line, the processes of treatment carried out for the substrates can be changed for each substrate conveniently. Thus, a plurality of different processes of treatment corresponding to the number of substrate treatment lines can be carried out in parallel for the respective substrates.