Kyoto, Japan

Hiromichi Nagashima

USPTO Granted Patents = 12 

 

Average Co-Inventor Count = 6.0

ph-index = 5

Forward Citations = 77(Granted Patents)


Location History:

  • Shimogyo-ku, JP (2014)
  • Kyoto, JP (2013 - 2019)

Company Filing History:


Years Active: 2013-2025

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12 patents (USPTO):Explore Patents

Title: Hiromichi Nagashima: Innovator in Substrate Treatment Technology

Introduction

Hiromichi Nagashima is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate treatment technology, holding a total of 12 patents. His innovative approaches have advanced the efficiency and effectiveness of substrate processing in various applications.

Latest Patents

One of Nagashima's latest patents is a substrate treating apparatus with parallel first and second parts of substrate treatment lines on multiple stories for simultaneously treating a plurality of substrates. This apparatus includes a plurality of substrate treatment lines arranged vertically, allowing for multiple types of treatment to be performed while transporting substrates horizontally. The controller enables convenient changes in treatment processes for each substrate treatment line, facilitating parallel processing of different treatments.

Another notable patent is a substrate treating apparatus featuring parallel gas supply pipes and a gas exhaust pipe. This method allows for resist film forming treatment and developing treatment to be performed in parallel across multiple stories within the treating section. Such innovations enhance the overall efficiency of substrate treatment processes.

Career Highlights

Throughout his career, Hiromichi Nagashima has worked with leading companies in the semiconductor industry, including Screen Semiconductor Solutions Co., Ltd. and Sokudo Co., Ltd. His experience in these organizations has contributed to his expertise in substrate treatment technologies.

Collaborations

Nagashima has collaborated with notable professionals in his field, including Yoshiteru Fukutomi and Tsuyoshi Mitsuhashi. These collaborations have further enriched his work and led to advancements in substrate treatment methodologies.

Conclusion

Hiromichi Nagashima's contributions to substrate treatment technology through his innovative patents and collaborations have significantly impacted the industry. His work continues to pave the way for advancements in substrate processing techniques.

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