The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2019
Filed:
Nov. 25, 2015
Applicant:
Screen Semiconductor Solutions Co., Ltd., Kyoto, JP;
Inventors:
Yoshiteru Fukutomi, Kyoto, JP;
Tsuyoshi Mitsuhashi, Kyoto, JP;
Hiroyuki Ogura, Kyoto, JP;
Kenya Morinishi, Kyoto, JP;
Yasuo Kawamatsu, Kyoto, JP;
Hiromichi Nagashima, Kyoto, JP;
Assignee:
SCREEN Semiconductor Solutions Co., Ltd., Kyoto, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B05C 13/02 (2006.01); H01L 23/34 (2006.01); B05C 13/00 (2006.01); G03F 7/26 (2006.01); B05D 3/04 (2006.01); B05B 14/43 (2018.01); B05B 14/44 (2018.01);
U.S. Cl.
CPC ...
H01L 21/67178 (2013.01); B05C 13/00 (2013.01); B05C 13/02 (2013.01); G03F 7/26 (2013.01); H01L 21/6715 (2013.01); H01L 21/67017 (2013.01); H01L 21/67173 (2013.01); H01L 21/67184 (2013.01); H01L 21/67196 (2013.01); H01L 21/67201 (2013.01); B05B 14/43 (2018.02); B05B 14/44 (2018.02); B05D 3/0486 (2013.01); H01L 21/67225 (2013.01); H01L 23/34 (2013.01); H01L 2924/0002 (2013.01); Y10S 414/135 (2013.01);
Abstract
A substrate treating method for treating substrates with a substrate treating apparatus having an indexer section, a treating section and an interface section includes performing resist film forming treatment in parallel on a plurality of stories provided in the treating section and performing developing treatment in parallel on a plurality of stories provided in the treating section.