Tokyo, Japan

Yoshikazu Tsunemine

This inventor holds 12 USPTO granted patents. Top assignees: Mitsubishi Denki Kabushiki Kaisha, Renesas Technology Corp., Other. Active years: 1997-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshikazu Tsunemine. Retrieved from https://idiyas.com/inventor/yoshikazu-tsunemine

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 66.7

Average Co-Inventor Count = 1.5

ph-index = 6

Forward Citations = 103(Granted Patents)


Location History:

  • Hyogo, JP (1997 - 2001)
  • Tokyo, JP (1999 - 2005)

Company Filing History:


Years Active: 1997-2005

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12 patents (USPTO):Explore Patents

Title: Innovations of Yoshikazu Tsunemine

Introduction

Yoshikazu Tsunemine is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work focuses on enhancing the reliability and efficiency of semiconductor devices.

Latest Patents

Tsunemine's latest patents include a semiconductor device designed to prevent deformation of electrodes during heat treatment processes. This innovation involves a manufacturing method where a conductive film, made from the same material as the lower electrode, is adhered to the top face of the conductive film through heat treatment. By using the same noble metal, such as ruthenium, for both the conductive film and the lower electrode, the connection between them is strengthened. This advancement ensures that the connection remains reliable even during heat treatments, thus improving the overall performance of the device.

Another notable patent is a capacitor manufacturing method that allows for the formation of lower electrodes with a high aspect ratio without compromising the electric characteristics of the capacitor. This method involves creating holes that reach contact plugs in an insulating film, followed by the formation of a dielectric film on the surfaces of these holes. The dielectric film is then etched away at the bottoms of the holes to facilitate the formation of lower electrodes, ensuring high performance and reliability.

Career Highlights

Throughout his career, Tsunemine has worked with notable companies such as Mitsubishi Electric Corporation and Renesas Technology Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Tsunemine has collaborated with esteemed colleagues, including Keiichiro Kashihara and Tomonori Okudaira. These partnerships have fostered a collaborative environment that has led to significant advancements in their respective fields.

Conclusion

Yoshikazu Tsunemine's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the development of reliable and efficient semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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