Average Co-Inventor Count = 2.6

ph-index = 5

Forward Citations = 68(Granted Patents)

Location History:

Hyogo, JP (2001 - 2010)
Chiyoda-Ku, JP (2011)
Tokyo, JP (2000 - 2012)
Ibaraki, JP (2020)

Company Filing History:

9 out of 3,781

Renesas Technology Corp.

Toppan Printing Co., Ltd.

patents

4. 2 out of 7,524

Renesas Electronics Corporation

patents

5. 2 out of 3,192

Dai Nippon Printing Co., Ltd.

patents

6. 2 out of 5

M. Watanabe Co., Ltd.

patents

7. 1 out of 21,351

Mitsubishi Denki Kabushiki Kaisha

patents

8. 3 out of 832,680

Other

patents

where one patent can have more than one assignee

Years Active: 2000-2020

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15 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10861786 - Semiconductor device having a multilayer structure (2020-12-08),

2. 8156451 - Method of manufacturing photomask (2012-04-10),

3. 7926010 - Method of determining defects in photomask (2011-04-12),

4. 7771904 - Photomask, and method and apparatus for producing the same (2010-08-10),

5. 7585599 - Photomask, and method and apparatus for producing the same (2009-09-08),

6. 7582397 - Photomask, and method and apparatus for producing the same (2009-09-01),

7. 7264905 - Photomask, and method and apparatus for producing the same (2007-09-04),

8. 7077915 - Method of and apparatus for washing photomask and washing solution for photomask (2006-07-18),

9. 7001470 - Cleaning process for photomasks (2006-02-21),

10. 6877151 - Photomask visual inspection system (2005-04-05),

11. 6740896 - Sensitivity adjusting method for pattern inspection apparatus (2004-05-25),

12. 6340543 - Photomask, manufacturing method thereof, and semiconductor device (2002-01-22),

13. 6277205 - Method and apparatus for cleaning photomask (2001-08-21),

14. 6209553 - Method of and apparatus for washing photomask and washing solution for photomask (2001-04-03),

15. 6071376 - Method and apparatus for cleaning photomask (2000-06-06),

Title: The Innovative Mind of Yoshikazu Nagamura

Introduction: Yoshikazu Nagamura, a pioneering inventor hailing from Hyogo, Japan, is renowned for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Yoshikazu Nagamura's recent patents focus on cutting-edge advancements in robotics and artificial intelligence, showcasing his commitment to pushing the boundaries of technological development.

Career Highlights: With a career spanning over two decades, Nagamura has held key positions in leading tech companies, where he spearheaded research projects that have led to significant technological breakthroughs. His expertise lies in the areas of automation, machine learning, and human-robot interaction.

Collaborations: Throughout his career, Yoshikazu Nagamura has collaborated with top research institutions and universities worldwide, fostering a culture of innovation and knowledge exchange. His collaborative efforts have resulted in the development of revolutionary technologies that have transformed various industries.

Conclusion: Yoshikazu Nagamura's relentless pursuit of innovation and his passion for creating technology that enhances the way we live and work make him a true visionary in the world of inventors. His contributions continue to inspire future generations of innovators to push the boundaries of what is possible in the realm of technology.

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