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For the Inventor, By the Inventor

Hyogo, Japan

Yoshikazu Nagamura

This inventor holds 15 USPTO granted patents and 2 published patent applications. Top assignees: Renesas Technology Corp., Dai Nippon Printing Co., Ltd., M. Watanabe Co., Ltd.. Active years: 2000-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshikazu Nagamura. Retrieved from https://idiyas.com/inventor/yoshikazu-nagamura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 15 

% Patents Active = 53.3

Average Co-Inventor Count = 2.6

ph-index = 5

Forward Citations = 74(Granted Patents)


Location History:

  • Hyogo, JP (2001 - 2010)
  • Chiyoda-Ku, JP (2011)
  • Tokyo, JP (2000 - 2012)
  • Ibaraki, JP (2020)

Company Filing History:

goldMedal9 out of 3,781 
 
Renesas Technology Corp.
 patents
silverMedal2 out of 3,208 
 
Dai Nippon Printing Co., Ltd.
 patents
bronzeMedal2 out of 5 
 
M. Watanabe Co., Ltd.
 patents
4. 2 out of 161 
 
Organo Corporation
 patents
5. 2 out of 7,654 
 
Renesas Electronics Corporation
 patents
6. 2 out of 1,269 
 
Toppan Printing Co., Ltd.
 patents
7. 1 out of 21,351 
 
Mitsubishi Denki Kabushiki Kaisha
 patents
8. 3 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 2000-2020

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15 patents (USPTO):Explore Patents
1. 10861786 - Semiconductor device having a multilayer structure (2020-12-08),
2. 8156451 - Method of manufacturing photomask (2012-04-10),
3. 7926010 - Method of determining defects in photomask (2011-04-12),
4. 7771904 - Photomask, and method and apparatus for producing the same (2010-08-10),
5. 7585599 - Photomask, and method and apparatus for producing the same (2009-09-08),
6. 7582397 - Photomask, and method and apparatus for producing the same (2009-09-01),
7. 7264905 - Photomask, and method and apparatus for producing the same (2007-09-04),
8. 7077915 - Method of and apparatus for washing photomask and washing solution for photomask (2006-07-18),
9. 7001470 - Cleaning process for photomasks (2006-02-21),
10. 6877151 - Photomask visual inspection system (2005-04-05),
11. 6740896 - Sensitivity adjusting method for pattern inspection apparatus (2004-05-25),
12. 6340543 - Photomask, manufacturing method thereof, and semiconductor device (2002-01-22),
13. 6277205 - Method and apparatus for cleaning photomask (2001-08-21),
14. 6209553 - Method of and apparatus for washing photomask and washing solution for photomask (2001-04-03),
15. 6071376 - Method and apparatus for cleaning photomask (2000-06-06),

Title: The Innovative Mind of Yoshikazu Nagamura

Introduction: Yoshikazu Nagamura, a pioneering inventor hailing from Hyogo, Japan, is renowned for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Yoshikazu Nagamura's recent patents focus on cutting-edge advancements in robotics and artificial intelligence, showcasing his commitment to pushing the boundaries of technological development.

Career Highlights: With a career spanning over two decades, Nagamura has held key positions in leading tech companies, where he spearheaded research projects that have led to significant technological breakthroughs. His expertise lies in the areas of automation, machine learning, and human-robot interaction.

Collaborations: Throughout his career, Yoshikazu Nagamura has collaborated with top research institutions and universities worldwide, fostering a culture of innovation and knowledge exchange. His collaborative efforts have resulted in the development of revolutionary technologies that have transformed various industries.

Conclusion: Yoshikazu Nagamura's relentless pursuit of innovation and his passion for creating technology that enhances the way we live and work make him a true visionary in the world of inventors. His contributions continue to inspire future generations of innovators to push the boundaries of what is possible in the realm of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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