The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2006

Filed:

Apr. 10, 2002
Applicants:

Koji Tange, Tokyo, JP;

Yoshikazu Nagamura, Tokyo, JP;

Kunihiro Hosono, Tokyo, JP;

Yasutaka Kikuchi, Tokyo, JP;

Yuki Oomasa, Tokyo, JP;

Koichi Kido, Tokyo, JP;

Inventors:

Koji Tange, Tokyo, JP;

Yoshikazu Nagamura, Tokyo, JP;

Kunihiro Hosono, Tokyo, JP;

Yasutaka Kikuchi, Tokyo, JP;

Yuki Oomasa, Tokyo, JP;

Koichi Kido, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25G 1/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A photomask provided with a light-shielding coating on a surface of a glass substrate is cleaned with Ogas solved water to eliminate organic substances adhered on a surface of the photomask (S). Using an alkaline chemical such as alkaline ionized water or hydrogenated water, the photomask is then cleaned to eliminate contamination (S). After completion of these cleaning steps, the photomask is dried (S).


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