IDiyas

For the Inventor, By the Inventor

Tokyo, Japan

Kunihiro Hosono

USPTO Granted Patents = 15

Average Co-Inventor Count = 1.5

ph-index = 8

Forward Citations = 194(Granted Patents)


Location History:

  • Itami, JP (1989 - 1992)
  • Hyogo, JP (1992 - 2003)
  • Tokyo, JP (1998 - 2006)

Company Filing History:

goldMedal12 out of 21,351 
 
Mitsubishi Denki Kabushiki Kaisha
 patents
silverMedal2 out of 3,781 
 
Renesas Technology Corp.
 patents
bronzeMedal1 out of 52 
 
Ryoden Semiconductor System Engineering Corporation
 patents
4. 1 out of 3,192 
 
Dai Nippon Printing Co., Ltd.
 patents
5. 1 out of 832,680 
Other
 patents
where one patent can have more than one assignee

Years Active: 1989-2006

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15 patents (USPTO):Explore Patents
1. 7001470 - Cleaning process for photomasks (2006-02-21),
2. 6841314 - Method of manufacturing a photomask (2005-01-11),
3. 6620557 - Photo-mask, photo-mask pair, semiconductor device and method of manufacturing a semiconductor device (2003-09-16),
4. 6537709 - Photo mask having film formed from halftone material, method of manufacturing photo mask, and method of manufacturing semiconductor device (2003-03-25),
5. 6503852 - Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device (2003-01-07),
6. 6433437 - Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device (2002-08-13),
7. 6340543 - Photomask, manufacturing method thereof, and semiconductor device (2002-01-22),
8. 6338923 - Photolithography mask having monitoring marks and manufacturing method thereof (2002-01-15),
9. 5767974 - Apparatus and method for identifying photomask pattern defects (1998-06-16),
10. 5464713 - Phase shift mask and method for repairing a defect of a phase shift mask (1995-11-07),
11. 5382484 - Method of correcting defects in the pattern of phase shift mask (1995-01-17),
12. 5272116 - Method for pattern defect correction of a photomask (1993-12-21),
13. 5093572 - Scanning electron microscope for observation of cross section and method (1992-03-03),
14. 5085957 - Method of repairing a mask (1992-02-04),
15. 4887283 - X-ray mask and exposure method employing the same (1989-12-12),
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