Location History:
- Itami, JP (1989 - 1992)
- Hyogo, JP (1992 - 2003)
- Tokyo, JP (1998 - 2006)
Company Filing History:
12 out of 21,351 
2 out of 3,781 
1 out of 52 Years Active: 1989-2006
Title: Kunihiro Hosono: Innovator in Photomask Technology
Introduction
Kunihiro Hosono is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photomask technology, holding a total of 15 patents. His innovative approaches have advanced the manufacturing processes and cleaning techniques for photomasks, which are essential in the semiconductor industry.
Latest Patents
One of Hosono's latest patents is a cleaning process for photomasks. This process involves using Ogas solved water to eliminate organic substances adhered to the surface of the photomask. Following this, an alkaline chemical, such as alkaline ionized water or hydrogenated water, is used to further clean the photomask and eliminate contamination. After these cleaning steps, the photomask is dried to ensure it is ready for use. Another notable patent is related to the method of manufacturing a photomask. In this process, photomask blanks are created by forming a half-tone film over a quartz substrate. This involves implanting ions at a predetermined depth to create a color center within the half-tone phase shift film. A desired pattern is then formed within photosensitive resist, which is applied over the half-tone film, exposed, and developed. The half-tone film is subsequently etched to create a predetermined pattern, and the exposed photosensitive resist is removed to fabricate the final photomask.
Career Highlights
Throughout his career, Kunihiro Hosono has worked with notable companies, including Mitsubishi Electric Corporation and Renesas Technology Corporation. His work in these organizations has allowed him to refine his expertise in photomask technology and contribute to various advancements in the field.
Collaborations
Hosono has collaborated with several talented individuals, including Yoshikazu Nagamura and Nobuyuki Yoshioka. These collaborations have fostered innovation and have been instrumental in the development of new technologies in photomask manufacturing.
Conclusion
Kunihiro Hosono's contributions to photomask technology through his patents and collaborations highlight his role as a key innovator in the semiconductor industry. His work continues to influence the field and pave the way for future advancements.