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M. Watanabe Co., Ltd.

USPTO Granted Patents = 5

Forward Citations = 18

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18 inventors (with patents filed for the assignee):

Koji Yamanaka (2 out of 70 patents)

Yoshikazu Nagamura (2 out of 15 patents)

Nobuyuki Yoshioka (2 out of 42 patents)

4. Hozumi Usui (2 out of 3 patents)

5. Masaki Kusuhara (1 out of 19 patents)

6. Masaru Umeda (1 out of 38 patents)

7. Masao Kikuchi (1 out of 39 patents)

8. Hiroyuki Watanabe (1 out of 66 patents)

9. Jinichi Omi (1 out of 6 patents)

10. Kunio Sugiyama (1 out of 2 patents)

11. Shuichi Tada (1 out of 1 patent)

12. Tadahiro Nakada (1 out of 1 patent)

13. Hirofumi Uehara (1 out of 1 patent)

14. Keiko Sanpei (1 out of 1 patent)

15. Masaru Nakamura (1 out of 2 patents)

5 patents: Sort by Forward Citations

1. 7140201 - Method for producing silica particles (2006-11-28),

2. 7077915 - Method of and apparatus for washing photomask and washing solution for photomask (2006-07-18),

3. 6888041 - Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus (2005-05-03),

4. 6071376 - Method and apparatus for cleaning photomask (2000-06-06),

5. 5138105 - Process and apparatus for recovering a lower alcohol from a mixture (1992-08-11),

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USPTO Data Jan 1 1976 - Dec 30 2025

5 Patents

#2,450 in Tokyo

#6,495 in Japan

M. Watanabe Co., Ltd.

Forward Citations = 18

18 inventors:

Koji Yamanaka (2 out of 70 patents)

Yoshikazu Nagamura (2 out of 15 patents)

Nobuyuki Yoshioka (2 out of 42 patents)

4. Hozumi Usui (2 out of 3 patents)

5. Masaki Kusuhara (1 out of 19 patents)

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