Location History:
- Saitama, JP (2000 - 2001)
- Tokyo, JP (2006)
Company Filing History:
2 out of 147 
2 out of 5 
1 out of 21,351 
Years Active: 2000-2006
Title: Hozumi Usui - Innovator in Photomask Cleaning Technologies
Introduction
Hozumi Usui is a notable inventor based in Saitama, Japan, recognized for his contributions to the field of photomask cleaning technologies. He holds three patents that focus on innovative methods and apparatuses for enhancing the cleaning process of photomasks used in semiconductor manufacturing.
Latest Patents
His latest patents include a "Method of and apparatus for washing photomask and washing solution for photomask." This invention addresses the removal of organic matter and metal impurities from the surface of photomasks. The method utilizes Hgas dissolved water to eliminate any foreign matter still adhering to the photomask's surface, followed by a drying process. This approach allows for effective cleaning with reduced chemical usage, achieving results that are equivalent or superior to conventional methods.
Career Highlights
Throughout his career, Hozumi Usui has worked with prominent companies such as Organo Corporation and Mitsubishi Electric Corporation. His experience in these organizations has significantly contributed to his expertise in photomask cleaning technologies.
Collaborations
Hozumi has collaborated with esteemed colleagues, including Yoshikazu Nagamura and Nobuyuki Yoshioka. These partnerships have fostered innovation and advancement in the field of semiconductor manufacturing.
Conclusion
Hozumi Usui's work in developing efficient cleaning methods for phot