Hyogo, Japan

Nobuyuki Yoshioka

This inventor holds 42 USPTO granted patents, primarily in Photomask Technology. Top assignees: Mitsubishi Denki Kabushiki Kaisha, Ulvac Coating Corporation, Kabushiki Kaisha Meidensha. Active years: 1983-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuyuki Yoshioka. Retrieved from https://idiyas.com/inventor/nobuyuki-yoshioka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.5

ph-index = 14

Forward Citations = 549(Granted Patents)


Location History:

  • Fujisawa, JP (1983)
  • Shizuoka, JP (1996)
  • Itami, JP (1988 - 1999)
  • Hyogo-ken, JP (1996 - 2004)
  • Tokyo, JP (1994 - 2006)
  • Hyogo, JP (1989 - 2007)

Company Filing History:


Years Active: 1983-2007

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Areas of Expertise:
Photomask
Phase Shifter
X-ray Mask
Semiconductor Device
Fabrication Method
Cleaning Process
Ion Implantation
Attenuating Type
Electrical Contact Material
Measurement Mark
Defect Repair
Manufacturing Method
42 patents (USPTO):Explore Patents

Title: The Innovative Journey of Nobuyuki Yoshioka: A Pioneer in Phase Shifter Technology

Introduction: Nobuyuki Yoshioka, hailing from Hyogo, Japan, is a prominent inventor with an impressive portfolio of 42 patents. His groundbreaking contributions to the field of technology and materials science have paved the way for advancements, particularly in the production of phase shift masks used in photolithography processes.

Latest Patents: Among his latest innovations is a highly specialized patent for a phase shifter film and its corresponding process. This invention focuses on the formation of a halftone type phase shift mask, which includes a reactive gas introduction inlet and an inert gas introduction inlet. By utilizing a reactive low throw sputtering method, Yoshioka successfully created a molybdenum silicide-based phase shifter film. This advancement enables the production of halftone type phase shift masks that are compatible with both ArF and KrF lasers, significantly enhancing the precision and efficacy of photolithography.

Career Highlights: Yoshioka has had a distinguished career, with notable tenures at Mitsubishi Electric Corporation, where he contributed to various technological innovations, and at Ulvac Coating Corporation, where he further developed his expertise in material science and manufacturing processes. His work has not only been recognized in Japan but also internationally, establishing him as a key figure in his field.

Collaborations: Throughout his career, Nobuyuki Yoshioka has collaborated with other esteemed professionals, including Akihiko Isao and Junji Miyazaki. These collaborations have facilitated the exchange of innovative ideas and techniques, further enhancing the scope of their collective research and developments in the field.

Conclusion: Nobuyuki Yoshioka's contributions to the world of invention, particularly in the realm of phase shifter technology, have left an indelible mark on the industry. With 42 patents to his name, his work continues to inspire future generations of inventors and innovators striving to push the boundaries of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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