The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2006
Filed:
Mar. 13, 2001
Susumu Kawada, Saitama, JP;
Akihiko Isao, Saitama, JP;
Nobuyuki Yoshioka, Hyogo, JP;
Kazuyuki Maetoko, Hyogo, JP;
Susumu Kawada, Saitama, JP;
Akihiko Isao, Saitama, JP;
Nobuyuki Yoshioka, Hyogo, JP;
Kazuyuki Maetoko, Hyogo, JP;
Ulvac Coating Corporation, Saitama, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
In the formation of a halftone type phase shift mask, a reactive gas introduction inlet and an inert gas introduction inlet are provided so as to introduce the respective gases separately and by using a reactive low throw sputtering method a molybdenum silicide based phase shifter film is formed. Thereby, it becomes possible to provide a halftone type phase shift mask, which is applicable to an ArF laser or to a KrF laser, by using molybdenum silicide based materials.