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For the Inventor, By the Inventor

Hyogo, Japan

Kazuyuki Maetoko

This inventor holds 5 USPTO granted patents. Top assignees: Ulvac Coating Corporation, Mitsubishi Denki Kabushiki Kaisha, Renesas Technology Corp.. Active years: 1997-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuyuki Maetoko. Retrieved from https://idiyas.com/inventor/kazuyuki-maetoko

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5

% Patents Active = 80.0

Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 45(Granted Patents)


Location History:

  • Itami, JP (1997)
  • Hyogo-ken, JP (2003)
  • Tokyo, JP (2006)
  • Hyogo, JP (2006 - 2007)

Company Filing History:

goldMedal3 out of 15 
 
Ulvac Coating Corporation
 patents
silverMedal2 out of 21,351 
 
Mitsubishi Denki Kabushiki Kaisha
 patents
bronzeMedal2 out of 3,781 
 
Renesas Technology Corp.
 patents
4. 1 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 1997-2007

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5 patents (USPTO):Explore Patents
1. 7282308 - Phase shifter film and process for the same (2007-10-16),
2. 7090947 - Phase shifter film and process for the same (2006-08-15),
3. 6984473 - Method of patterning a mask blank (2006-01-10),
4. 6569577 - Phase-shift photo mask blank, phase-shift photo mask and method for fabricating semiconductor devices (2003-05-27),
5. 5605776 - Phase-shifting photomask blank, phase-shifting photomask, and method of (1997-02-25),

Title: Kazuyuki Maetoko: Innovator in Phase Shifter Technology

Introduction

Kazuyuki Maetoko is a prominent inventor based in Hyogo, Japan. He has made significant contributions to the field of phase shifter technology, holding a total of 5 patents. His work has been instrumental in advancing the capabilities of halftone type phase shift masks, which are essential in photolithography processes.

Latest Patents

One of Maetoko's latest patents involves a phase shifter film and the process for its creation. In this innovation, a halftone type phase shift mask is formed by providing a reactive gas introduction inlet and an inert gas introduction inlet. This allows for the separate introduction of gases. By utilizing a reactive low throw sputtering method, a molybdenum silicide-based phase shifter film is created. This advancement enables the production of halftone type phase shift masks that are applicable to both ArF and KrF lasers, utilizing molybdenum silicide-based materials.

Career Highlights

Throughout his career, Kazuyuki Maetoko has worked with notable companies such as Ulvac Coating Corporation and Mitsubishi Electric Corporation. His experience in these organizations has contributed to his expertise in the field of phase shifter technology.

Collaborations

Maetoko has collaborated with several talented individuals, including Akihiko Isao and Susumu Kawada. These partnerships have fostered innovation and development in his projects.

Conclusion

Kazuyuki Maetoko's contributions to phase shifter technology and his innovative patents have made a significant impact in the field. His work continues to influence advancements in photolithography, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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