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For the Inventor, By the Inventor

Osaka, Japan

Yohei Sawada

This inventor holds 21 USPTO granted patents, primarily in Fluid Control Technology. Top assignees: Fujikin Inc., Tokyo Electron Limited, Futikin Incorporated. Active years: 2012-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yohei Sawada. Retrieved from https://idiyas.com/inventor/yohei-sawada

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21

% Patents Active = 81.0

Average Co-Inventor Count = 4.9

ph-index = 6

Forward Citations = 103(Granted Patents)


Company Filing History:

goldMedal18 out of 450 
 
Fujikin Inc.
 patents
silverMedal2 out of 10,918 
 
Tokyo Electron Limited
 patents
bronzeMedal1 out of 1 
 
Futikin Incorporated
 patent
4. 1 out of 103 
 
Tokyo Electron Limi Ted
 patents
where one patent can have more than one assignee

Years Active: 2012-2022

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Areas of Expertise:
Fluid Control System
Flow Rate Measurement
Valve Device
Gas Supply Device
Flow Rate Control
Abnormality Detection
Calibration Method
Pressure-Type Flow Control
Variable Orifice
Piezoelectric Valve
Substrate Processing
Self-Diagnosis Method
21 patents (USPTO):Explore Patents
1. 11460869 - Fluid control system and flow rate measurement method (2022-10-04),
2. 11339881 - Valve device and fluid control device (2022-05-24),
3. 11326921 - Flow rate measuring method and flow rate measuring device (2022-05-10),
4. 11313756 - Flow rate control device and abnormality detection method using flow rate control device (2022-04-26),
5. 11137779 - Fluid control device, method for controlling fluid control device, and fluid control system (2021-10-05),
6. 10969259 - Flow rate control device, method of calibrating flow rate of flow rate control device, flow rate measuring device, and method of measuring flow rate using flow rate measuring device (2021-04-06),
7. 10928813 - Pressure-type flow rate control device and flow rate self-diagnosis method using critical expansion condition (2021-02-23),
8. 10895484 - Gas supply device capable of measuring flow rate, flowmeter, and flow rate measuring method (2021-01-19),
9. 10876870 - Method of determining flow rate of a gas in a substrate processing system (2020-12-29),
10. 10665430 - Gas supply system, substrate processing system and gas supply method (2020-05-26),
11. 10648572 - Valve with built-in orifice, and pressure-type flow rate control device (2020-05-12),
12. 9638560 - Calibration method and flow rate measurement method for flow rate controller for gas supply device (2017-05-02),
13. 9507352 - Variable orifice type pressure-controlled flow controller (2016-11-29),
14. 9477232 - Apparatus for dividing and supplying gas and method for dividing and supplying gas (2016-10-25),
15. 9261884 - Apparatus for dividing and supplying gas and method for dividing and supplying gas by use of this apparatus (2016-02-16),

Title: Yohei Sawada: Pioneering Inventor from Osaka, JP

Introduction: Yohei Sawada is a renowned inventor hailing from Osaka, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Yohei Sawada holds several patents in the areas of robotics, artificial intelligence, and renewable energy, showcasing his innovative mindset and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Sawada has worked with leading tech companies in Japan, spearheading projects that have revolutionized industries and improved efficiency in manufacturing processes.

Collaborations: Throughout his career, Yohei Sawada has collaborated with top researchers and engineers from prestigious universities and research institutions in Japan, fostering a culture of innovation and knowledge-sharing.

Conclusion: Yohei Sawada's passion for innovation and his relentless drive to push the boundaries of technology make him a true trailblazer in the world of inventions. His work continues to inspire the next generation of inventors and engineers worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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