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Hopewell Junction, NY, United States of America

Yiheng Xu

USPTO Granted Patents = 48 

Average Co-Inventor Count = 4.9

ph-index = 6

Forward Citations = 121(Granted Patents)


Location History:

  • Clifton Park, NY (US) (2018 - 2020)
  • Hopewell Junction, NY (US) (2009 - 2021)

Company Filing History:

goldMedal42 out of 164,108 
 
International Business Machines Corporation
 patents
silverMedal29 out of 2,867 
 
Stmicroelectronics Gmbh
 patents
bronzeMedal6 out of 5,671 
 
Globalfoundries Inc.
 patents
4. 1 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents
5. 1 out of 962 
 
Chartered Semiconductor Manufacturing Ltd (corporation)
 patents
where one patent can have more than one assignee

Years Active: 2009-2021

where 'Filed Patents' based on already Granted Patents

48 patents (USPTO):
1. 10950722 - Vertical gate all-around transistor (2021-03-16),
2. 10832965 - Fin reveal forming STI regions having convex shape between fins (2020-11-10),
3. 10790198 - Fin structures (2020-09-29),
4. 10700214 - Overturned thin film device with self-aligned gate and source/drain (S/D) contacts (2020-06-30),
5. 10546743 - Advanced interconnect with air gap (2020-01-28),
6. 10388639 - Self-aligned three dimensional chip stack and method for making the same (2019-08-20),
7. 10361289 - Gate oxide formation through hybrid methods of thermal and deposition processes and method for producing the same (2019-07-23),
8. 10347617 - Self-aligned three dimensional chip stack and method for making the same (2019-07-09),
9. 10319630 - Encapsulated damascene interconnect structure for integrated circuits (2019-06-11),
10. 10304815 - Self-aligned three dimensional chip stack and method for making the same (2019-05-28),
11. 10211045 - Microwave annealing of flowable oxides with trap layers (2019-02-19),
12. 10026849 - Structure and process for overturned thin film device with self-aligned gate and S/D contacts (2018-07-17),
13. 9984933 - Silicon liner for STI CMP stop in FinFET (2018-05-29),
14. 9905511 - Modular fuses and antifuses for integrated circuits (2018-02-27),
15. 9837394 - Self-aligned three dimensional chip stack and method for making the same (2017-12-05),

As an AI assistant specialized in innovations, inventions, inventors, patent attorneys, assignees, and patents, I will provide you with an article about inventor Yiheng Xu based on the given data.

Title: The Innovative Works of Yiheng Xu: Pioneering Vertical GAA FET Structures and Fin Reveal Forming STI Regions

Introduction:

Yiheng Xu, a prolific inventor based in Hopewell Junction, NY (US), has made significant contributions to the field of semiconductor technology with an impressive portfolio of 48 patents. His groundbreaking work focuses on advancing design and performance criteria in the 7 nm technology generation.

Latest Patents:

Yiheng Xu's latest patents showcase his expertise in vertical gate all-around transistor (Vertical GAA FET) structures. These cutting-edge designs feature a current-carrying nanowire oriented perpendicular to the silicon substrate, enabling optimal performance in advanced semiconductor devices. Additionally, his innovations in fin reveal forming shallow trench isolation (STI) regions demonstrate novel techniques to enhance integrated circuit devices' efficiency and functionality.

Career Highlights:

Throughout his career, Yiheng Xu has been associated with top-tier companies in the semiconductor industry. He has made substantial contributions during his tenure at IBM (International Business Machines Corporation) and STMicroelectronics GmbH, where he played a pivotal role in driving innovation and pushing the boundaries of semiconductor technology.

Collaborations:

Yiheng Xu's collaborative efforts with esteemed colleagues such as John H Zhang and Carl John Radens have been instrumental in realizing groundbreaking inventions and patent applications. Their synergistic work has paved the way for significant advancements in semiconductor design and manufacturing processes.

Conclusion:

In conclusion, Yiheng Xu's innovative spirit and technical prowess have established him as a trailblazer in the semiconductor industry. His relentless pursuit of excellence and groundbreaking inventions continue to shape the future of semiconductor technology, setting new standards and pushing the boundaries of innovation.

If you need further information or details, feel free to explore our website idiyas.com, dedicated to celebrating innovators like Yiheng Xu and their groundbreaking contributions to the world of patents and inventions.

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