Yi-Tse Hung

Title: Innovations of Yi-Tse Hung in Semiconductor Technology

Introduction

Yi-Tse Hung is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

Among his latest patents is a semiconductor device that includes a heat transfer layer disposed over a substrate, a channel material layer, a gate structure, and source and drain terminals. The channel material layer has a first surface and a second surface opposite to the first surface, and it is positioned on the heat transfer layer with the first surface in contact with it. The gate structure is located above the channel material layer, while the source and drain terminals are in contact with the channel material layer and situated at two opposite sides of the gate structure. Another notable patent is for a fin field-effect transistor device that utilizes low-dimensional material. This method involves forming a dielectric fin protruding above a substrate, creating a channel layer over the dielectric fin, and establishing a gate structure above the channel layer.

Career Highlights

Yi-Tse Hung is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative work has positioned him as a key figure in advancing semiconductor technologies.

Collaborations

He collaborates with talented coworkers, including Hung-Li Chiang and Tzu-Chiang Chen, who contribute to his projects and research endeavors.

Conclusion

Yi-Tse Hung's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to drive advancements in semiconductor devices, showcasing the importance of innovation in technology.