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For the Inventor, By the Inventor

Taipei, Taiwan

Yen-Cheng Lu

USPTO Granted Patents = 60

Average Co-Inventor Count = 4.0

ph-index = 8

Forward Citations = 1,093(Granted Patents)


Inventors with similar research interests:


Location History:

  • Taipei, TW (2016 - 2017)
  • New Taipei, TW (2014 - 2021)

Company Filing History:

goldMedal60 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2014-2021

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Areas of Expertise:
Extreme Ultraviolet Lithography
Photomask Fabrication
Integrated Circuit Patterning
Defect Printability Mitigation
Charged Particle Beam Lithography
Resolution Enhancement Techniques
Mask Fabrication Methods
EUV Collector Contamination Reduction
Layer Pattern Definition
Multilayer Deposition Method
Exposure Intensity Adjustment
Semiconductor Structure Patterns
60 patents (USPTO):Explore Patents
1. 11086227 - Method to mitigate defect printability for ID pattern (2021-08-10),
2. 10976655 - Extreme ultraviolet lithography system, device, and method for printing low pattern density features (2021-04-13),
3. 10691014 - Extreme ultraviolet lithography system, device, and method for printing low pattern density features (2020-06-23),
4. 10684552 - Method to mitigate defect printability for ID pattern (2020-06-16),
5. 10520823 - EUV lithography system and method with optimized throughput and stability (2019-12-31),
6. 10162257 - Extreme ultraviolet lithography system, device, and method for printing low pattern density features (2018-12-25),
7. 10156790 - EUV lithography system and method with optimized throughput and stability (2018-12-18),
8. 9996013 - Extreme ultraviolet lithography process and mask (2018-06-12),
9. 9964850 - Method to mitigate defect printability for ID pattern (2018-05-08),
10. 9829785 - Extreme ultraviolet lithography process and mask (2017-11-28),
11. 9760015 - Extreme ultraviolet lithography process (2017-09-12),
12. 9748133 - Via definition scheme (2017-08-29),
13. 9733562 - Extreme ultraviolet lithography process and mask (2017-08-15),
14. 9726983 - Method to define multiple layer patterns with a single exposure by charged particle beam lithography (2017-08-08),
15. 9690186 - Extreme ultraviolet lithography process and mask (2017-06-27),

Title: Yen-Cheng Lu: Pioneering Female Inventor from New Taipei

Introduction: Yen-Cheng Lu is a trailblazing inventor hailing from New Taipei, Taiwan. She has made significant contributions to the field of innovation with her groundbreaking ideas and inventions.

Latest Patents: Yen-Cheng Lu holds several patents in various technological domains, including renewable energy, healthcare devices, and sustainable materials. Her innovative solutions have garnered attention worldwide for their practicality and impact.

Career Highlights: Throughout her illustrious career, Yen-Cheng Lu has received numerous accolades for her inventive spirit and dedication to creating solutions that address pressing global challenges. Her work has been recognized for its creativity and potential to shape the future of technology.

Collaborations: Yen-Cheng Lu has collaborated with leading research institutions, universities, and companies to further develop and commercialize her inventions. These partnerships have been instrumental in bringing her ideas to life and making a tangible difference in the world.

Conclusion: Yen-Cheng Lu's passion for innovation and her relentless pursuit of excellence have established her as a prominent figure in the world of inventors. Her contributions continue to inspire future generations to push the boundaries of what is possible through creativity and ingenuity.

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