This inventor holds 7 USPTO granted patents. Top assignees: Tokyo Electron Limited, Yasuhiro Horiike, Research Development Corporation of Japan. Active years: 1993-2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Hikarigaoka, Higashi-ku, Hiroshima-shi, Hiroshima-ken, JP (1994)
- Hiroshima, JP (1993 - 1996)
- Tokyo-to, JP (1998)
- Hoya-shi, Tokyo, JP (2000)
- Nerima-ku, JP (2000)
Company Filing History:
5 out of 10,918 
2 out of 2 
1 out of 256 
Years Active: 1993-2000
Title: Yasuhiro Horiike: Innovator in Plasma Technology
Introduction
Yasuhiro Horiike is a prominent inventor based in Hiroshima, Japan. He has made significant contributions to the field of plasma technology, holding a total of seven patents. His work focuses on advanced plasma generation techniques that have applications in various industries.
Latest Patents
Horiike's latest patents include the ECR plasma generator and an ECR system utilizing this generator. The ECR plasma generator operates by applying radio frequency ranging from 3 to 300 MHz from a power supply to an electrode within a chamber. This chamber, equipped with an exhaust system, serves as a shower head for gas introduction. Power is supplied to a coil at the chamber's outer periphery, forming a magnetic field that is an integer multiple of the resonant magnetic field corresponding to the applied radio frequency. This setup generates ECR plasma in an atmosphere of the supplied process gas. Another notable patent is the sputtering method and apparatus, where a target and a wafer are positioned in a quartz tube processing vessel. A low bias voltage is applied to the wafer while Helicon wave plasma of high density is generated. This innovative approach allows for the deposition of seeds from the target onto the wafer without voids, particularly in grooves and holes of high aspect ratios.
Career Highlights
Throughout his career, Horiike has worked with notable companies, including Tokyo Electron Limited. His expertise in plasma technology has positioned him as a key figure in the development of advanced manufacturing processes.
Collaborations
Horiike has collaborated with talented individuals such as Kohei Kawamura and Takayuki Fukasawa. These collaborations have further enhanced his innovative work in the field of plasma technology.
Conclusion
Yasuhiro Horiike's contributions to plasma technology through his patents and collaborations highlight his role as a leading inventor in this specialized field. His work continues to influence advancements in various applications, showcasing the importance of innovation in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile