The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 1993
Filed:
Dec. 07, 1990
Applicant:
Inventors:
Assignee:
Research Development Corporation of Japan, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J / ; B01J / ; C23C / ; C23C / ;
U.S. Cl.
CPC ...
42218605 ; 4221863 ; 118720 ;
Abstract
This invention provides an atmospheric plasma reaction method characterized by introducing a mixed gas of rare gas and reactive gas into a reaction vessel having a dielectric-coated electrode wherein the surface of two or more electrodes located parallel therewith are provided with solid dielectrics, exciting said mixed gas with plasma at atmospheric pressure, then transporting the active species to the downstream of the plasma and treating the surface of a substrate. This invention also provides an atmospheric plasma reaction apparatus.