The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2000
Filed:
Jul. 02, 1998
Applicant:
Inventors:
Yasuhiro Horiike, Hoya-shi, Tokyo, JP;
Kohei Kawamura, Yamanashi-ken, JP;
Assignees:
Tokyo Electron Limited, Tokyo, JP;
Other;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; H05H / ; H05H / ;
U.S. Cl.
CPC ...
1187 / ; 156345 ; 427571 ; 1187 / ; 1187 / ;
Abstract
In an ECR plasma generator, radio frequency ranging from 3 to 300 MHz is applied from a radio frequency power supply to an electrode which is provided in a chamber having an exhaust system and which serves as a shower head for gas introduction, and power is supplied to a coil provided at the outer periphery of the chamber, so as to form a magnetic field an integer number of times as large as a resonant magnetic field corresponding to the applied radio frequency, parallel with the direction of an electric field and to generate ECR plasma in an atmosphere of the supplied process gas.