Location History:
- Kai, JP (2009 - 2011)
- Nirasaki, JP (2007 - 2024)
Company Filing History:
Years Active: 2007-2025
Title: Yamato Tonegawa: Innovator in Semiconductor Technology
Introduction
Yamato Tonegawa, an inventive mind hailing from Nirasaki, Japan, has made significant contributions to the field of semiconductor technology. With a portfolio of 17 patents, Tonegawa is recognized for his innovative methods and systems that enhance film deposition processes in semiconductor manufacturing.
Latest Patents
Among his latest inventions is a unique deposition method that focuses on depositing a silicon nitride film onto a substrate surface. This method incorporates the intermittent supply of trisilylamine into a processing chamber that accommodates the substrate, thus optimizing the film deposition process. Additionally, Tonegawa has developed a comprehensive film forming method and system, which consists of a series of cycles involving the supply of a raw material gas and a reaction gas to the substrate, followed by processing with deuterium plasma. These patents exemplify his forward-thinking approaches and technical expertise in semiconductor fabrication.
Career Highlights
Tonegawa is affiliated with Tokyo Electron Limited, a revered company in the semiconductor industry. Over his career, he has focused on enhancing manufacturing techniques, significantly impacting the efficiency and effectiveness of semiconductor production. His work not only supports the advancement of technology but also plays a crucial role in the evolution of electronic devices.
Collaborations
Throughout his career, Tonegawa has collaborated with esteemed colleagues such as Takehiko Fujita and Mitsuhiro Okada. These partnerships have fostered an environment of creativity and innovation, leading to breakthroughs in their respective fields.
Conclusion
Yamato Tonegawa’s contributions to semiconductor technology through his patents highlight the importance of innovation in today’s tech-driven world. As he continues to push the boundaries of what is possible in film deposition and processing techniques, Tonegawa's work will undoubtedly pave the way for future advancements in the industry.