The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2026
Filed:
May. 12, 2023
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Kazumasa Igarashi, Yamanashi, JP;
Yamato Tonegawa, Yamanashi, JP;
Jun Ogawa, Yamanashi, JP;
Yuki Tanaka, Yamanashi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0214 (2013.01); H01L 21/02233 (2013.01); H01L 21/31116 (2013.01);
Abstract
A substrate processing method includes preparing a substrate having a target film including silicon, carbon, and nitrogen on a surface of the substrate; supplying hydrogen gas and oxygen gas to the target film to oxidize a surface layer of the target film and form an oxide film; and etching the oxide film.
Igarashi, Kazumasa. (2026). Substrate processing method and substrate processing apparatus for etching using oxidization (U.S. Patent No. 12588440). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12588440
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile