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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11694890 B1

PDFFull Text
Date of Patent:
Jul. 04, 2023

Filed:

Mar. 25, 2020

Substrate processing method and substrate processing apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Kiwamu Ito, Nirasaki, JP;

Keiko Hosoe, Nirasaki, JP;

Yamato Tonegawa, Nirasaki, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorneys:

Nath, Goldberg & Meyer

Jerald L. Meyer

Tanya E. Harkins

Primary Examiner:

Jarrett J Stark

Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/02 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02123 (2013.01); C23C 16/45536 (2013.01); H01L 21/0228 (2013.01); H01L 21/02345 (2013.01); H01L 21/67017 (2013.01);
Abstract

A substrate processing method for forming a nitride film on a substrate, includes: a raw material gas supply step of supplying a raw material gas containing an element to be nitrided; a hydrogen gas supply step of, after the raw material gas supply step, supplying a hydrogen gas activated by plasma; a thermal nitriding step of supplying a first nitriding gas containing nitrogen activated by heat and nitriding the element; and a plasma nitriding step of supplying a second nitriding gas containing nitrogen activated by plasma and nitriding the element.

Find Patent Forward Citations

Ito, Kiwamu. (2023). Substrate processing method and substrate processing apparatus (U.S. Patent No. 11694890). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11694890

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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