IDiyas

For the Inventor, By the Inventor

Foster City, CA, United States of America

Xiaoyi Chen

USPTO Granted Patents = 17 


Average Co-Inventor Count = 3.6

ph-index = 8

Forward Citations = 215(Granted Patents)


Location History:

  • Redwood City, CA (US) (2004)
  • Foster City, CA (US) (2004 - 2019)

Company Filing History:

goldMedal12 out of 13,684 
 
Applied Materials, Inc.
 patents
silverMedal5 out of 832,680 
Other
 patents

Years Active: 2004-2019

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17 patents (USPTO):
1. 10199224 - Method for improving CD micro-loading in photomask plasma etching (2019-02-05),
2. 10115572 - Methods for in-situ chamber clean in plasma etching processing chamber (2018-10-30),
3. 9425062 - Method for improving CD micro-loading in photomask plasma etching (2016-08-23),
4. 7829243 - Method for plasma etching a chromium layer suitable for photomask fabrication (2010-11-09),
5. 7635546 - Phase shifting photomask and a method of fabricating thereof (2009-12-22),
6. 7320942 - Method for removal of metallic residue after plasma etching of a metal layer (2008-01-22),
7. 7105361 - Method of etching a magnetic material (2006-09-12),
8. 6984585 - Method for removal of residue from a magneto-resistive random access memory (MRAM) film stack using a sacrificial mask layer (2006-01-10),
9. 6964928 - Method for removing residue from a magneto-resistive random access memory (MRAM) film stack using a dual mask (2005-11-15),
10. 6942813 - Method of etching magnetic and ferroelectric materials using a pulsed bias source (2005-09-13),
11. 6933239 - Method for removing conductive residue (2005-08-23),
12. 6911346 - Method of etching a magnetic material (2005-06-28),
13. 6841484 - Method of fabricating a magneto-resistive random access memory (MRAM) device (2005-01-11),
14. 6821907 - Etching methods for a magnetic memory cell stack (2004-11-23),
15. 6759263 - Method of patterning a layer of magnetic material (2004-07-06),

Title: Xiaoyi Chen: Pioneering Inventor in Tech Innovation

Introduction:

Xiaoyi Chen, a relentless innovator based in Foster City, CA (US), has made a significant mark in the tech landscape with his passion for innovation and commitment to creating solutions that drive positive change. With 17 patents to his name, Xiaoyi Chen's dedication to pushing the boundaries of technology cements his legacy as a pioneering inventor.

Latest Patents:

Among Xiaoyi Chen's latest patents is the "Method for improving CD micro-loading in photomask plasma etching," which focuses on enhancing the process of etching a mask layer for manufacturing photomasks in cutting-edge applications like EUV and binary photomask technologies. Another notable patent is the "Methods for in-situ chamber clean in plasma etching processing chamber," which demonstrates his expertise in optimizing plasma processing chambers for photomask fabrication.

Career Highlights:

Xiaoyi Chen has honed his craft at reputable companies, including Applied Materials, Inc., where he has contributed significantly to technological advancements. His innovative spirit and technical acumen have propelled him to the forefront of the industry, garnering recognition for his groundbreaking work in plasma etching processes.

Collaborations:

Throughout his career, Xiaoyi Chen has collaborated with esteemed colleagues such as Ajay Kumar and Chentsau Chris Ying. These partnerships have been instrumental in driving forward innovative solutions and fostering a collaborative environment conducive to groundbreaking inventions.

Conclusion:

In conclusion, Xiaoyi Chen's unwavering passion for innovation, coupled with his technical expertise, has solidified his position as a trailblazing inventor in the ever-evolving tech landscape. His dedication to creating impactful solutions sets a standard for aspiring inventors and underscores the importance of continuous innovation in driving technological progress.

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