The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Apr. 17, 2003
Chentsau Ying, Cupertino, CA (US);
Xiaoyi Chen, Foster City, CA (US);
Chun Yan, San Jose, CA (US);
Ajay Kumar, Sunnyvale, CA (US);
Chentsau Ying, Cupertino, CA (US);
Xiaoyi Chen, Foster City, CA (US);
Chun Yan, San Jose, CA (US);
Ajay Kumar, Sunnyvale, CA (US);
Other;
Abstract
A method of etching a multi-layer magnetic stack (e.g., layers of cobalt-iron alloy (CoFe), ruthenium (Ru), platinum-manganese alloy (PtMn), and the like) of a magneto-resistive random access memory (MRAM) device is disclosed. Each layer of the multi-layer magnetic stack is etched using a process sequence including a plasma etch step followed by a plasma treatment step. The plasma treatment step uses a plasma comprising an inert gas to remove residues formed during the plasma etch step.