William John Durand

Title: The Innovations of William John Durand

Introduction

William John Durand is a notable inventor based in San Francisco, CA. He has made significant contributions to the field of technology, particularly in the area of substrate processing. With a total of 8 patents to his name, Durand's work has had a considerable impact on various industrial applications.

Latest Patents

Durand's latest patents include innovative methods and apparatus for processing a substrate. These patents provide advanced solutions for gas supply systems used in processing chambers. One such patent describes a gas supply that includes an ampoule for storing a precursor, which is designed to mix with a carrier gas. This system features a sensor assembly that allows for precise measurement of the precursor concentration, enhancing the efficiency of the processing chamber. Another significant patent involves a capacitive sensor for monitoring gas concentration, which includes interdigitated electrodes to improve measurement accuracy.

Career Highlights

Durand has built a successful career at Applied Materials, Inc., where he has been instrumental in developing cutting-edge technologies. His expertise in substrate processing has positioned him as a leader in his field. His contributions have not only advanced the technology but have also paved the way for future innovations.

Collaborations

Throughout his career, Durand has collaborated with talented individuals such as Philip Allan Kraus and Kelvin Chan. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

William John Durand's work exemplifies the spirit of innovation in the technology sector. His patents and contributions continue to influence the industry, showcasing the importance of creativity and collaboration in advancing technology.