The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2023
Filed:
Jun. 05, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Kenric Choi, San Jose, CA (US);
William J. Durand, San Francisco, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/448 (2006.01); C23C 16/455 (2006.01); B01F 35/20 (2022.01);
U.S. Cl.
CPC ...
C23C 16/4482 (2013.01); B01F 35/20 (2022.01); C23C 16/45553 (2013.01); C23C 16/45561 (2013.01); C23C 16/45589 (2013.01);
Abstract
Apparatus and methods for supplying a vapor to a processing chamber are described. The vapor delivery apparatus comprises an inlet conduit and an outlet conduit, each with two valves, in fluid communication with an ampoule. A bypass conduit connects the inlet conduit and the outlet conduit. A flow restrictive device restricts flow through the outlet conduit.
Choi, Kenric. (2023). Apparatus and methods for controlling concentration of precursors to processing chamber (U.S. Patent No. 11753715). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11753715
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile