The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2025
Filed:
Oct. 07, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Abdullah Zafar, Santa Clara, CA (US);
William John Durand, Oakland, CA (US);
Xinyuan Chong, Milpitas, CA (US);
Kenric Choi, San Jose, CA (US);
Weize Hu, Sunnyvale, CA (US);
Kelvin Chan, San Ramon, CA (US);
Amir Bayati, San Jose, CA (US);
Michelle Sanpedro, Mountain View, CA (US);
Philip A. Kraus, San Jose, CA (US);
Adolph Miller Allen, Oakland, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Methods and apparatus for processing a substrate are provided herein. For example, a gas supply configured for use with a processing chamber includes an ampoule that stores a precursor and comprises an input to receive a carrier gas and an output to provide a mixture of the carrier gas and the precursor to the processing chamber and a sensor assembly comprising a detector and an infrared source operably connected to an outside of an enclosure, through which the mixture flows, and a gas measurement volume disposed within the enclosure and along an inner wall thereof so that a concentration of the precursor in the mixture can be measured by the detector and transmitted to a controller.