Phoenix, AZ, United States of America

Wentao Wang

This inventor holds 16 USPTO granted patents and 23 published patent applications, primarily in Semiconductor Processing. Top assignee: Asm IP Holding B.v.. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wentao Wang. Retrieved from https://idiyas.com/inventor/wentao-wang-4ayxhhzm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 3

Forward Citations = 39(Granted Patents)


Location History:

  • Phoenix, AZ (US) (2019 - 2024)
  • Chandler, AZ (US) (2024)

Company Filing History:


Years Active: 2019-2026

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Areas of Expertise:
Chemical Vapor Deposition
Semiconductor Deposition
Substrate Supports
Gas Injection
Temperature Control
Film Deposition
High Temperature Coatings
Reactor Systems
Epitaxial Systems
Gas Distribution
Quartz Devitrification
Dual Pyrometer Systems
16 patents (USPTO):Explore Patents

Title: Innovations of Wentao Wang: A Pioneer in Semiconductor Technology

Introduction

Wentao Wang, an accomplished inventor based in Phoenix, AZ, has made significant contributions to semiconductor technology. With an impressive portfolio consisting of six patents, he has established himself as a key player in the industry. His innovative ideas have the potential to revolutionize chemical vapor deposition processes, enhancing efficiency and effectiveness in various applications.

Latest Patents

One of Wentao Wang's latest patents is centered around a semiconductor deposition reactor and components designed for reduced quartz devitrification. This groundbreaking system is engineered to minimize devitrification within a chemical vapor deposition system by integrating a susceptor support ring positioned strategically between the gas inlet and gas outlet of the chamber passage. Moreover, the system incorporates a getter support featuring a support base with one or more recesses arranged to hold corresponding support elements that stabilize the getter plate. A notable aspect of this innovation is the use of a silicon carbide (SiC) coating on the getter support, with a thickness of at least 50 microns, all optimized for proximity to the susceptor support ring within 1 mm to 10 mm.

Career Highlights

Wentao Wang currently works for ASML IP Holding B.V., a company renowned for its advanced technology in the semiconductor field. Throughout his career, he has demonstrated a strong commitment to pushing the boundaries of innovation in semiconductor manufacturing processes.

Collaborations

Collaboration is a vital part of Wentao Wang's success. He has had the opportunity to work alongside talented coworkers like Xing Lin and Junwei Su, further enhancing the collaborative spirit within the organization. These partnerships have fostered an environment conducive to innovation, allowing for the exchange of ideas and advancements in semiconductor technology.

Conclusion

In conclusion, Wentao Wang's contributions to the field of semiconductor technology are noteworthy. His latest patents demonstrate not only his skills as an inventor but also his commitment to advancing the industry. With continued collaboration and innovation, Wentao Wang is poised to make even greater strides in the future, solidifying his legacy as a prominent figure in the world of semiconductor inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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