The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2025
Filed:
Apr. 27, 2022
Asm Ip Holding B.v., Almere, NL;
Shujin Huang, Tempe, AZ (US);
Junwei Su, Tempe, AZ (US);
Xing Lin, Chandler, AZ (US);
Alexandros Demos, Scottsdale, AZ (US);
Rutvij Naik, Tempe, AZ (US);
Wentao Wang, Chandler, AZ (US);
Matthew Goodman, Chandler, AZ (US);
Robin Scott, Phoenix, AZ (US);
Amir Kajbafvala, Chandler, AZ (US);
Robinson James, Phoenix, AZ (US);
Youness Alvandi-Tabrizi, Tempe, AZ (US);
Caleb Miskin, Mesa, AZ (US);
ASM IP Holding B.V., Almere, NL;
Abstract
A susceptor has a circular pocket portion, an annular ledge portion, and an annular rim ledge portion. The circular pocket portion is arranged along a rotation axis and has a perforated surface. The annular ledge portion extends circumferentially about pocket portion and has ledge surface that slopes axially upward from the perforated surface. The rim portion extends circumferentially about the ledge portion and is connected to the pocket portion by the ledge portion of the susceptor. The susceptor has one or more of a tuned pocket, a contact break, a precursor vent, and a purge channel located radially outward of the perforated surface to control deposition of a film onto a substrate supported by the susceptor. Semiconductor processing systems, film deposition methods, and methods of making susceptors are also described.