The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Aug. 28, 2023
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Peipei Gao, Chandler, AZ (US);
Wentao Wang, Chandler, AZ (US);
Han Ye, Phoenix, AZ (US);
Kai Zhou, Phoenix, AZ (US);
Fan Gao, Chandler, AZ (US);
Xing Lin, Chandler, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); C23C 16/458 (2006.01); H10P 14/24 (2026.01); H10P 72/00 (2026.01); H10P 72/76 (2026.01);
U.S. Cl.
CPC ...
H10P 72/7611 (2026.01); C23C 16/4585 (2013.01); H10P 14/24 (2026.01); H10P 72/0402 (2026.01); H10P 72/0602 (2026.01);
Abstract
Methods, systems, and assemblies suitable for gas-phase processes are disclosed. An exemplary assembly includes a susceptor ring and at least one injector tube. The injector tube can be disposed within the susceptor ring to provide a gas to a peripheral region of a substrate. Methods, systems, and assemblies can be used to obtain desired (e.g. composition and/or thickness) profiles of material on a substrate surface.