Wenjin Shao

This inventor holds 17 USPTO granted patents and 1 published patent application, primarily in Lithography Calibration. Top assignee: Asml Netherlands B.v.. Active years: 2013-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wenjin Shao. Retrieved from https://idiyas.com/inventor/wenjin-shao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 17 (Patent Applications = 1)

% Patents Active = 76.5

Average Co-Inventor Count = 4.2

ph-index = 6

Forward Citations = 65(Granted Patents)

Location History:

Sunnyvalle, CA (US) (2014)
Sunnyvale, CA (US) (2013 - 2020)

Company Filing History:

17 out of 5,080

Asml Netherlands B.v.

patents

Years Active: 2013-2020

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Areas of Expertise:

Lithography Calibration

Model-Based Tuning

Parameter-Sensitive Design

Process Simulation

Calibration Patterns

Harmonic Resist Model

Noise Sensitivity

Computational Lithography

17 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10846442 - Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration (2020-11-24),

2. 10569469 - Model-based scanner tuning systems and methods (2020-02-25),

3. 10137643 - Model-based process simulation systems and methods (2018-11-27),

4. 10025885 - Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration (2018-07-17),

5. 10025198 - Smart selection and/or weighting of parameters for lithographic process simulation (2018-07-17),

6. 9672301 - Pattern selection for lithographic model calibration (2017-06-06),

7. 9588439 - Information matrix creation and calibration test pattern selection based on computational lithography model parameters (2017-03-07),

8. 8942463 - Harmonic resist model for use in a lithographic apparatus and a device manufacturing method (2015-01-27),

9. 8930172 - Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration (2015-01-06),

10. 8887105 - Calibration pattern selection based on noise sensitivity (2014-11-11),

11. 8874423 - Model-based scanner tuning systems and methods (2014-10-28),

12. 8806387 - Model-based process simulation systems and methods (2014-08-12),

13. 8694928 - Pattern selection for lithographic model calibration (2014-04-08),

14. 8682059 - Harmonic resist model for use in a lithographic apparatus and a device manufacturing method (2014-03-25),

15. 8571845 - Model-based scanner tuning systems and methods (2013-10-29),

Title: The Innovative Journey of Wenjin Shao

Introduction: Wenjin Shao, a talented inventor based in Sunnyvale, CA, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Wenjin Shao holds several patents in the areas of artificial intelligence, machine learning, and robotics. His most recent patent involves a revolutionary algorithm for optimizing energy consumption in smart home devices.

Career Highlights: With a background in computer science and engineering, Wenjin Shao has worked for top tech companies in Silicon Valley, where he honed his skills in innovation and problem-solving. Throughout his career, he has been recognized for his ability to turn complex ideas into practical solutions.

Collaborations: Wenjin Shao has collaborated with leading researchers and engineers from prestigious universities and research institutions to push the boundaries of technology. His collaborative projects have resulted in cutting-edge inventions that have the potential to shape the future of various industries.

Conclusion: In conclusion, Wenjin Shao's passion for innovation and his dedication to creating impactful solutions have solidified his reputation as a visionary inventor in the tech community. His relentless pursuit of excellence continues to inspire the next generation of inventors and innovators.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

1 patent pending: