The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2013
Filed:
May. 29, 2009
Yu Cao, Cupertino, CA (US);
Wenjin Shao, Sunnyvale, CA (US);
Ronaldus Johannes Gljsbertus Goossens, Los Altos, CA (US);
Jun YE, Palo Alto, CA (US);
James Patrick Koonmen, Santa Clara, CA (US);
Yu Cao, Cupertino, CA (US);
Wenjin Shao, Sunnyvale, CA (US);
Ronaldus Johannes Gljsbertus Goossens, Los Altos, CA (US);
Jun Ye, Palo Alto, CA (US);
James Patrick Koonmen, Santa Clara, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Systems and methods for tuning photolithographic processes are described. A model of a target scanner is maintained defining sensitivity of the target scanner with reference to a set of tunable parameters. A differential model represents deviations of the target scanner from the reference. The target scanner may be tuned based on the settings of the reference scanner and the differential model. Performance of a family of related scanners may be characterized relative to the performance of a reference scanner. Differential models may include information such as parametric offsets and other differences that may be used to simulate the difference in imaging behavior.