Los Altos, CA, United States of America

Ronaldus Johannes Gljsbertus Goossens

This inventor holds 2 USPTO granted patents. Top assignee: Asml Netherlands B.v.. Active years: 2013-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ronaldus Johannes Gljsbertus Goossens. Retrieved from https://idiyas.com/inventor/ronaldus-johannes-gljsbertus-goossens

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 50.0

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2013-2014

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Ronaldus Johannes Gljsbertus Goossens: Inspiring the Next Generation of Inventors

Introduction:

Ronaldus Johannes Gljsbertus Goossens, a prolific inventor based in Los Altos, CA, continues to captivate and inspire the next generation with his unyielding passion for innovation and creativity. With a relentless pursuit of pushing the boundaries of what is possible, Goossens has made significant contributions to the field of computational lithography model calibration and photolithographic process tuning.

Latest Patents:

1. Pattern selection for lithographic model calibration: Goossens' invention focuses on methods and apparatuses for test pattern selection for computational lithography model calibration. By automatically selecting the most effective test patterns from a pool of candidates, Goossens ensures optimal model parameter values are determined, driving prediction accuracy to its upper bound.

2. Model-based scanner tuning systems and methods: Goossens' innovation describes systems and methods for tuning photolithographic processes. By maintaining a model of a target scanner and utilizing a differential model to represent deviations, Goossens enables the tuning of the scanner based on a reference scanner's settings. This approach allows for the characterization of the performance of related scanners relative to a reference scanner.

Career Highlights:

Currently working at ASML Netherlands B.V., Goossens' expertise and dedication have significantly impacted the advancement of lithographic technologies. His contributions have not only led to the development of cutting-edge solutions but have also played a pivotal role in shaping the future of the industry.

Collaborations:

Goossens has collaborated closely with esteemed colleagues such as Yu Long Cao and Wenjin Shao. Together, they have worked tirelessly to innovate and create groundbreaking solutions in the realm of computational lithography and photolithographic processes.

Conclusion:

Ronaldus Johannes Gljsbertus Goossens stands as a beacon of inspiration for aspiring inventors, demonstrating the power of passion, dedication, and a relentless pursuit of innovation. His groundbreaking patents and career achievements serve as a testament to his unwavering commitment to pushing the boundaries of what is possible in the world of technology and invention.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…