The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2017
Filed:
Dec. 20, 2011
Antoine Jean Bruguier, Milpitas, CA (US);
Yu Cao, Saratoga, CA (US);
Jun YE, Palo Alto, CA (US);
Wenjin Shao, Sunnyvale, CA (US);
Antoine Jean Bruguier, Milpitas, CA (US);
Yu Cao, Saratoga, CA (US);
Jun Ye, Palo Alto, CA (US);
Wenjin Shao, Sunnyvale, CA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
Embodiments of the present invention describe methods of selecting a subset of test patterns from an initial larger set of test patterns for calibrating a computational lithography model. An example method comprises: generating an information matrix for the initial larger set of test patterns, wherein the terms of the information matrix comprise one or more identified model parameters that represent a lithographic process response; and, executing a selection algorithm using terms of the information matrix to select the subset of test patterns that effectively determines values of the identified model parameters that contribute significantly in the lithographic process response, wherein the subset of test patterns characteristically represents the initial larger set of test patterns. The selection algorithm explores coverage relationships existing in the initial larger set of test patterns.