The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
May. 17, 2013
Yu Cao, Saratoga, CA (US);
Luoqi Chen, Saratoga, CA (US);
Antoine Jean Bruguier, Milpitas, CA (US);
Wenjin Shao, Sunnyvale, CA (US);
Yu Cao, Saratoga, CA (US);
Luoqi Chen, Saratoga, CA (US);
Antoine Jean Bruguier, Milpitas, CA (US);
Wenjin Shao, Sunnyvale, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for determining an image of a mask pattern in a resist coated on a substrate, the method including determining an aerial image of the mask pattern at substrate level; and convolving the aerial image with at least two orthogonal convolution kernels to determine a resist image that is representative of the mask pattern in the resist.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile