The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Oct. 26, 2012
Antoine Jean Bruguier, Milpitas, CA (US);
Wenjin Shao, Sunnyvalle, CA (US);
Song Lan, Cupertino, CA (US);
Antoine Jean Bruguier, Milpitas, CA (US);
Wenjin Shao, Sunnyvalle, CA (US);
Song Lan, Cupertino, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The preset invention provides methods, systems and computer program product for selection of an optimum set of patterns to calibrate a lithography model so that the model can predict imaging performance of a lithography apparatus/system more accurately and reliably without being prohibitively expensive in terms of using computational and metrology resources and time. The method is based on modeling sensitivity of the calibration patterns to measurement noise. In one aspect of the present invention, a method is disclosed, comprising: identifying a model of at least a portion of a lithographic process; identifying a set of patterns for calibrating the model; and, estimating measurement noise associated with the set of patterns.