Wei-Min Liu

Title: Innovations of Wei-Min Liu in Semiconductor Technology

Introduction

Wei-Min Liu is a prominent inventor based in Tainan, Taiwan, known for his significant contributions to semiconductor technology. With a total of 17 patents to his name, Liu has made remarkable advancements in the field, particularly in the manufacturing processes of semiconductor devices.

Latest Patents

Among his latest patents, one notable invention is a semiconductor device and method of manufacture. This method involves flowing first precursors over a semiconductor substrate to create an epitaxial region that includes a first element and a second element. The process also includes converting a second precursor into first radicals and first ions, separating these components, and flowing the first radicals over the epitaxial region to eliminate some of the second element. Another significant patent focuses on methods of forming transistor source/drain regions that comprise carbon liner layers. In this embodiment, a device features a first nanostructure and a source/drain region adjoining a first channel region, which includes a main layer and a first liner layer with a higher carbon concentration than the main layer.

Career Highlights

Wei-Min Liu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in enhancing the efficiency and performance of semiconductor devices, making him a key figure in the field.

Collaborations

Liu has collaborated with notable colleagues such as Yee-Chia Yeo and Li-Li Su, contributing to various innovative projects and research initiatives.

Conclusion

Wei-Min Liu's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the industry. His work continues to influence advancements in semiconductor manufacturing processes.