Wan-jae Park

Title: Innovations of Wan-jae Park

Introduction

Wan-jae Park is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of microelectronics, holding a total of 12 patents. His work primarily focuses on advanced etching techniques and methods for fabricating interconnections in microelectronic devices.

Latest Patents

One of his latest patents is titled "Methods of patterning insulating layers using etching techniques that compensate for etch rate variations." This invention involves forming an integrated circuit substrate with an electrically insulating layer and a mask layer pattern. The method allows for simultaneous etching of different portions of the insulating layer at varying rates, resulting in trenches of different depths. Another significant patent is "Method of fabricating interconnections of microelectronic device using dual damascene process." This method outlines a process for creating interconnections in microelectronic devices, including the preparation of a semiconductor substrate and the formation of conductive materials to establish upper interconnections.

Career Highlights

Wan-jae Park has worked with prominent companies in the technology sector, including Samsung Electronics and Chartered Semiconductor Manufacturing. His experience in these organizations has contributed to his expertise in microelectronics and patent development.

Collaborations

Throughout his career, Wan-jae Park has collaborated with notable colleagues such as Kyoung-woo Lee and Soo-geun Lee. These partnerships have likely enhanced his innovative capabilities and contributed to his success in the field.

Conclusion

Wan-jae Park's contributions to microelectronics through his patents and collaborations highlight his role as a significant inventor in the industry. His innovative methods continue to influence the development of advanced technologies.