Wai Lo

Title: Innovations and Contributions of Inventor Wai Lo

Introduction

Wai Lo is a notable inventor based in Lake Oswego, OR (US). He holds a total of 18 patents that reflect his significant contributions to the field of semiconductor technology. His work focuses on enhancing the performance and efficiency of integrated circuits, particularly in the context of CMOS transistors.

Latest Patents

Wai Lo's latest patents include innovative methods aimed at improving gate stack profiles and reducing leakage currents in high-K dielectric films. One of his patents, titled "Application of gate edge liner to maintain gate length CD in a replacement gate transistor flow," describes a method to maintain a well-defined gate stack profile. This method involves depositing an inert insulating liner after dummy gate etch and before the spacer process, which helps in controlling gate length CD. The technology is designed to be compatible with multiple generations of CMOS transistors, including those at the 65 nm, 45 nm, and 25 nm technology nodes.

Another significant patent is "Bi-axial texturing of high-K dielectric films to reduce leakage currents." This invention outlines methods for fabricating high-K dielectric films with a high degree of crystallographic alignment at grain boundaries. The process involves using an ion beam to assist in the preferential formation of crystal lattices, resulting in dielectric films that exhibit improved performance.

Career Highlights

Wai Lo has worked with prominent companies in the semiconductor industry, including LSI Logic Corporation and LSI Corporation. His experience in these organizations has contributed to his expertise in developing advanced technologies for integrated circuits.

Collaborations

Wai Lo has collaborated with notable colleagues such as Hong Lin and Sey-Shing Sun. Their combined efforts have led to significant advancements in semiconductor technology.

Conclusion

Wai Lo's innovative patents and career achievements highlight his important role in the field of semiconductor technology. His contributions continue to influence the development of efficient and effective integrated circuits.