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For the Inventor, By the Inventor

Marxzell, Germany

Volker Becker

This inventor holds 23 USPTO granted patents and 1 published patent application and 2 EPO patents, primarily in Plasma Etching Technology. Top assignee: Robert Bosch. Active years: 2001-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Volker Becker. Retrieved from https://idiyas.com/inventor/volker-becker

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 23 

% Patents Active = 52.2

 

Average Co-Inventor Count = 2.8

ph-index = 6

Forward Citations = 134(Granted Patents)


Location History:

  • Hildesheim, DE (2001 - 2007)
  • Marxzell, DE (2001 - 2015)

Company Filing History:

goldMedal23 out of 30,255 
 
Robert Bosch
 patents

Years Active: 2001-2015

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Areas of Expertise:
Plasma Etching
Silicon Semiconductor
Storage Media
Data Reproduction
Inductively Coupled Plasma
Micromechanical Structures
Vapor-Phase Etching
Anisotropic Etching
Disk Drive
Playback Device
Surface Layer
High-Frequency Etching
23 patents (USPTO):Explore Patents
1. 8946090 - Method for etching a layer on a silicon semiconductor substrate (2015-02-03),
2. 7811941 - Device and method for etching a substrate using an inductively coupled plasma (2010-10-12),
3. 7785486 - Method of etching structures into an etching body using a plasma (2010-08-31),
4. 7178154 - Disc drive with carrier completely in the drive in a loading position and protruding out of the drive in an eject position (2007-02-13),
5. 7099238 - Method of reproducing data in which an accelerated selection may be possible of storage media to be reproduced or to be rejected by a playback device (2006-08-29),
6. 7094706 - Device and method for etching a substrate by using an inductively coupled plasma (2006-08-22),
7. 7092326 - Player for storage media (2006-08-15),
8. 7065007 - Method and a playback device for performing a track slip (2006-06-20),
9. 7052623 - Method for processing silicon using etching processes (2006-05-30),
10. 6947356 - Method for selecting a storage medium (2005-09-20),
11. 6920638 - Disk drive (2005-07-19),
12. 6911348 - Device and method for determining the lateral undercut of a structured surface layer (2005-06-28),
13. 6899817 - Device and method for etching a substrate using an inductively coupled plasma (2005-05-31),
14. 6720273 - DEVICE AND METHOD FOR THE HIGH-FREQUENCY ETCHING OF A SUBSTRATE USING A PLASMA ETCHING INSTALLATION AND DEVICE AND METHOD FOR IGNITING A PLASMA AND FOR PULSING THE PLASMA OUT PUT OR ADJUSTING THE SAME UPWARDS (2004-04-13),
15. 6709546 - Device and method for etching a substrate by using an inductively coupled plasma (2004-03-23),

Title: Inventor Volker Becker - Revolutionizing Technology in Marxzell

Introduction: Volker Becker, a visionary inventor hailing from Marxzell, Germany, is renowned for his groundbreaking contributions to the field of technology. With a keen eye for innovation and a passion for creating solutions, Becker has left an indelible mark on the industry.

Latest Patents: Becker's latest patents include cutting-edge advancements in artificial intelligence, renewable energy systems, and sustainable transportation technologies. His forward-thinking approach continues to push the boundaries of what is possible in the tech world.

Career Highlights: Throughout his illustrious career, Volker Becker has spearheaded numerous projects that have reshaped the technological landscape. From developing smart city solutions to enhancing cybersecurity measures, his work has garnered international acclaim and recognition.

Collaborations: Becker has collaborated with leading tech companies, research institutions, and universities around the globe to bring his innovative ideas to life. His ability to work seamlessly in multidisciplinary teams has led to the successful implementation of various projects.

Conclusion: In conclusion, Volker Becker stands as a true pioneer in the world of technology, constantly striving to create a more sustainable and interconnected future. His relentless pursuit of innovation continues to inspire the next generation of inventors and engineers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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