Suwon-si, South Korea

Vasily Pashkovskiy

USPTO Granted Patents = 8 


Average Co-Inventor Count = 6.5

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Yongin-si, KR (2010)
  • Gyeonggi-do, KR (2019)
  • Osan-si, KR (2017 - 2020)
  • Suwon-si, KR (2015 - 2024)

Company Filing History:


Years Active: 2010-2024

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8 patents (USPTO):Explore Patents

Title: Vasily Pashkovskiy: Innovator in Plasma Technology and Semiconductor Manufacturing

Introduction

Vasily Pashkovskiy, a distinguished inventor based in Suwon-si, South Korea, has made significant contributions to the fields of plasma technology and semiconductor manufacturing. With a total of eight patents to his name, Pashkovskiy’s innovations reflect a deep understanding of complex materials and manufacturing processes.

Latest Patents

His latest patents include a device for measuring the density of plasma, a plasma processing system, and a semiconductor device manufacturing method utilizing a hollow cathode. The plasma density measurement device employs a first sensor designed to capture the microwave spectrum of plasma reflection parameters. Additionally, this system features a second sensor that detects optical signals generated from the plasma. The second sensor is adept at measuring signals through the probe of the first sensor.

Pashkovskiy’s work on the hollow cathode comprises an innovative apparatus that includes an insulation plate embedded with cathode holes, aligned bottom electrodes, and top electrodes. This invention aims to enhance the semiconductor manufacturing process by providing improved control over the plasma environment.

Career Highlights

Pashkovskiy works at Samsung Electronics Co., Ltd., a leading global technology company known for its cutting-edge innovations. His tenure at the company showcases his dedication to advancing semiconductor technologies and plasma applications, which serve as critical components in modern electronic devices.

Collaborations

Throughout his career, Pashkovskiy has collaborated with notable peers such as Sang Ki Nam and Se-jin Oh. These partnerships have fostered a productive environment for innovation, resulting in successful advancements in technology and manufacturing processes.

Conclusion

With a strong portfolio of patents and a career dedicated to technological advancement, Vasily Pashkovskiy stands out as a key contributor to the fields of plasma measurements and semiconductor manufacturing. His work not only exemplifies innovation but also demonstrates the impactful collaboration with fellow experts in the industry. As technology continues to evolve, Pashkovskiy’s contributions will undoubtedly play a pivotal role in shaping the future of electronic manufacturing.

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