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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10566176 B1

PDFFull Text
Date of Patent:
Feb. 18, 2020

Filed:

Feb. 07, 2017

Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the system

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Se-jin Oh, Hwaseong-si, KR;

Woong Ko, Osan-si, KR;

Vasily Pashkovskiy, Osan-si, KR;

Doug-yong Sung, Seoul, KR;

Ki-ho Hwang, Seoul, KR;

Assignee:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Attorney:

Myers Bigel, P.A.

Primary Examiner:

Yuechuan Yu

Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/66 (2006.01); H01L 21/263 (2006.01); G01N 22/00 (2006.01); H01L 21/3065 (2006.01); H01L 21/67 (2006.01); H01R 9/05 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32935 (2013.01); G01N 22/00 (2013.01); H01J 37/32082 (2013.01); H01L 21/263 (2013.01); H01L 21/3065 (2013.01); H01L 21/67253 (2013.01); H01L 22/26 (2013.01); H01R 9/05 (2013.01);
Abstract

Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor device using the system. The microwave probe includes a body extending in one direction and a head which is connected to one end of the body and has a flat plate shape. In addition, in the plasma process, the microwave probe is non-invasively coupled to a chamber such that a surface of the head contacts an outer surface of a viewport of the chamber, and the microwave probe applies a microwave into the chamber through the head and receives signals generated inside the chamber through the head.

Find Patent Forward Citations

Oh, Se-jin. (2020). Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the system (U.S. Patent No. 10566176). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10566176

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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