The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Sep. 09, 2013
Jung Hyun Cho, Suwon-si, KR;
Hyung Joon Kim, Suwon-si, KR;
Sang Jean Jeon, Hwaseong-si, KR;
Sang Heon Lee, Seongnam-si, KR;
Jeong Yun Lee, Yongin-si, KR;
Kyung Yub Jeon, Yongin-si, KR;
Vasily Pashkovskiy, Suwon-si, KR;
Jung Hyun Cho, Suwon-si, KR;
Hyung Joon Kim, Suwon-si, KR;
Sang Jean Jeon, Hwaseong-si, KR;
Sang Heon Lee, Seongnam-si, KR;
Jeong Yun Lee, Yongin-si, KR;
Kyung Yub Jeon, Yongin-si, KR;
Vasily Pashkovskiy, Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Gyeonggi-do, KR;
Abstract
A method of operating a plasma processing device includes outputting a first RF power having a first frequency and a first duty ratio, and outputting a second RF power having a second frequency higher than the first frequency and a second duty ratio smaller than the first duty ratio. The outputting of the first RF power and the outputting of the second RF power are synchronized with each other.