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For the Inventor, By the Inventor

Koshi, Japan

Tsukasa Hirayama

This inventor holds 10 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2009-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsukasa Hirayama. Retrieved from https://idiyas.com/inventor/tsukasa-hirayama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10

% Patents Active = 90.0

Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Tosu, JP (2009)
  • Kumamoto, JP (2017 - 2021)
  • Koshi, JP (2016 - 2022)

Company Filing History:

goldMedal10 out of 10,904 
 
Tokyo Electron Limited
 patents

Years Active: 2009-2026

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10 patents (USPTO):Explore Patents
1. 12603254 - Etching method and plasma processing apparatus (2026-04-14),
2. 12575350 - Substrate processing method and substrate processing apparatus (2026-03-10),
3. 12272526 - Substrate processing method and substrate processing apparatus (2025-04-08),
4. 11309194 - Substrate liquid treatment apparatus (2022-04-19),
5. 11087992 - Substrate processing method and substrate processing apparatus (2021-08-10),
6. 11062922 - Substrate liquid processing apparatus (2021-07-13),
7. 10643874 - Substrate liquid processing apparatus, substrate liquid processing method, and storage medium (2020-05-05),
8. 9721813 - Liquid processing apparatus with cleaning jig (2017-08-01),
9. 9321085 - Substrate processing method, storage medium storing computer program for implementing substrate processing method and substrate processing apparatus (2016-04-26),
10. 7581335 - Substrate drying processing apparatus, method, and program recording medium (2009-09-01),

Title: The Innovative Contributions of Tsukasa Hirayama

Introduction

Tsukasa Hirayama is a prominent inventor based in Koshi, Japan, known for his significant contributions to substrate processing technologies. With a total of eight patents to his name, Hirayama has made a notable impact in the field of semiconductor manufacturing.

Latest Patents

Hirayama's latest patents include a substrate processing method and a substrate liquid treatment apparatus. The substrate processing method involves several steps, including providing a substrate with an etching target film and a mask, forming a first layer containing nitrogen and hydrogen atoms, modifying this layer with a halogen-containing gas, and etching the recess using a third processing gas. The substrate liquid treatment apparatus features an inner tank for storing treatment liquid, an outer tank, and a movable lid that ensures effective splash protection while maintaining accessibility to the inner tank.

Career Highlights

Hirayama is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on developing advanced technologies that enhance the efficiency and effectiveness of substrate processing.

Collaborations

Throughout his career, Hirayama has collaborated with notable colleagues, including Takao Inada and Hiroshi Tanaka, contributing to various innovative projects and advancements in their field.

Conclusion

Tsukasa Hirayama's inventive spirit and dedication to advancing substrate processing technologies have established him as a key figure in the semiconductor industry. His patents reflect a commitment to innovation that continues to shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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